Ion Beam

An ion beam is a beam produced by accelerating ions at high speeds. Ions are positively or negatively charged 

atoms or groups of atoms. Ion acceleration is the movement of ions to their destination by applying an arbitrary 

voltage. The momentum of the accelerator is proportional to the applied voltage. According to the application of 

ion transfer, the electrodes that apply voltage are acceleration electrode, extraction electrode, suppression 

electrode, deflection electrode, deflection electrode, etc. They are used in ion engines, ion beam sputtering, ion 

implantation, focused ion beam (FIB), and accelerators. In order to prevent the potential inside the device from 

being biased towards the accelerated ion potential, in some cases it is possible that it will be electrically neutralized 

by accelerating ions to produce ions.

To generate an ion beam for the FIB, a liquid metal ion source (LMIS) consisting of needle-like tungsten wires 

connected with gallium is used. When the filament is heated and a voltage is applied to the extraction electrode, 

an ion beam is generated from the tip. The resulting ions are then controlled by the electric and magnetic fields 

of the accelerator, forming a narrow directional flow. Ion beam control is used for ion beam scanning. The ions 

extracted from the ion source are focused by a condenser lens (CL) and the ion beam is scanned by an electrostatic 

deflector. Ion beams are used in a wide range of applications, such as ion beam injection, ion beam processing, 

and scanning ion microscopy (SIM).

An ion beam generator consists of an ion source (ion gun), an electromagnetic lens in an accelerator and a 

deflector. Ion beams are passed through accelerators for the injection of impurity ions into semiconductors, 

surface cleaning through ion milling, surface treatment, surface modification, and surface and internal analysis. 

The ion beam is accelerated and decelerated in a vacuum by an electric field and deflected by a magnetic field. 

Ion mass separation is carried out by bending ions in a magnetic field, and energy analysis is carried out by 

decelerating electric field method and static electric field deflection analysis.

Wisman offers a wide range of power devices for ion acceleration, extraction, suppression, deflection, focusing, 

meshing and neutralization. Wisman power supplies for electrostatic deflectors are available in a wide range of 

specifications, in particular we offer high-voltage amplifiers with the highest level of response speed in the world. 

With DC bias function, you can easily adjust the scanning reference point of the scan.

Ion beam Power Supply:

SEM, HEM, EM