Electron beam lithography is the use of electron beam processing equipment and scanning electron microscopy 

technology to produce semiconductor masks for LSI production. Electron beam lithography is also known as 

electron beam lithography (EB lithography) or EBL. A mask, also known as a mask, acts like a photographic film as 

a substrate for transferring the circuit pattern of an electronic component to a chip or other object to be transferred.

In electron beam lithography, an electron beam (E beam) emitted from an electron gun is focused by an electron 

lens into a very small spot of light. By controlling the movement of the converging electron beam and the 

movement of the stage according to the lithography pattern, the lithography material is electrolithographed. The 

control of the electron beam and the stage is based on the electron beam processing equipment and scanning 

electron microscopy technology.

The electron gun and electron lens required for electron beam lithography equipment require a high-precision and 

high-voltage power supply to operate.

The Wisman High Voltage Power Supply 3D series is specifically designed to power electron lenses for electron 

guns and electron beam lithography devices. These high voltage power supplies can also be customized to meet 

customer requirements.

Wisman has a range of power supplies available for electron beam lithography. Example: 3D; 3DA; EM ;  SEM.