An ion beam is a beam produced by accelerating ions at high speed. Ion is an atom or mass of atoms that is positively or negatively charged. Ion acceleration is to move an ion to the destination by applying an arbitrary voltage. The momentum of acceleration increases in proportion to the magnitude of the applied voltage. According to applications of ion transfer, electrodes to apply the voltage are known for accelerating electrode, extraction electrode, suppressing electrode, deflecting electrode, deflecting electrode, etc. They are used in ion engines, ion beam sputtering, ion implantation, focused ion beam (FIB), and accelerators. In order to prevent the potential inside the device from being biased against the accelerating ion potential, there are some cases where it may be electrically neutralized by generating ions to the accelerating one. The device is called "Neutralizer".

To generate an ion beam for FIB, a liquid metal ion source (LMIS) consisting of a needle-shaped tungsten filament with gallium attached is used. When the filament is heated and voltage is applied to the extraction electrode, an ion beam is generated from the tip. The generated ions are then controlled by the accelerator's electric and magnetic fields to form a narrow, directional stream. Ion beam steering is used in ion beam scanning. Ions which are extracted from the ion source are focused by a condenser lens (CL), and the ion beam is scanned by an electrostatic deflector. Ion beams are used for a wide range of applications such as ion beam implantation, ion beam processing and scanning ion microscope (SIM).

The ion beam generator consists of an ion source (ion gun), an electromagnetic lens in the accelerator, and a deflector. The ion beam passes through an accelerator and is used for ion implantation of impurities into semiconductors, surface cleaning by ion milling, surface processing, surface modification, and surface and internal analysis. The ion beam is accelerated and decelerated by an electric field in a vacuum, and deflected by a magnetic field. Ion mass sorting is performed by bending the ions in a magnetic field, and energy analysis is performed by decelerating electric field method and electrostatic field deflection analysis method.

Wisman offers a variety of power supply equipment for ion acceleration, extraction, suppression, deflection, focusing, gridding and neutralization. Wisman high voltage power supplies designed for electrostatic deflectors have various kinds of specifications, and especially we provide high voltage amplifiers featuring the world's highest level of response speed. With the DC bias function, the scanning reference point of scanning can be easily adjusted.

Ion Beam Power Supply:

Ion beam:SEM  HEM  EM

Electron beam:3D,3DA